R&D Engineering, Engineer

Category Engineering Hire Type Employee Job ID 11922 Remote Eligible No Date Posted 29/06/2025

Key Responsibilities:

1.Algorithm Development

Develop or optimize state-of-the-art machine learning (ML) and deep learning (DL) algorithms for mask synthesis applications.

2.Feature Engineering

Design and extract appropriate features from lithography data—including target pattern images, mask 2D/3D patterns, wafer resist 2D/3D images, and wafer etch 2D/3D images—for training ML/DL models.

3.Model Training

Train ML/DL models using the extracted features from design, mask, and wafer data.

4.Model Deployment

Deploy trained ML/DL models into mask synthesis software tools for production use.

Skills and Qualifications:

1.Technical Expertise

Proficient in ML/DL libraries such as TensorFlow and PyTorch. Familiar with advanced models for image and vector data, including GANs, diffusion models, and Transformers.

2.Learning and Problem-Solving

Demonstrates a strong desire to learn new technologies and possesses solid investigation and problem-solving skills.

3.Domain Knowledge

Has a solid understanding of the specialization area (e.g., computational lithography, ML/DL) and working knowledge of related domains.

4.Creative Problem Resolution

Resolves issues creatively and exercises independent judgment in selecting methods and techniques to develop solutions.

5.Project Execution

Manages projects from start to finish, contributing to moderately complex aspects and developing actionable recommendations.

6.Team Collaboration

Works effectively on team-based or task-oriented projects. Collaborates with senior internal in the field.

At Synopsys, we want talented people of every background to feel valued and supported to do their best work. Synopsys considers all applicants for employment without regard to race, color, religion, national origin, gender, sexual orientation, age, military veteran status, or disability.